| Item name |
Titanium tube target
|
| Size |
OD133*ID125*840 |
| Grade |
Gr1 |
| Packaging |
Vacuum package in wooden casex |
| Port of place |
Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
Vacuum coating technology is generally divided into two categories, namely physical vapor deposition (PVD) technology and chemical vapor deposition (CVD) technology.
Physical vapor deposition technology refers to the method of directly depositing the plating material on the surface of the substrate by gasification into atoms and molecules or ionization into ions by various physical methods under vacuum conditions. Hard reaction films are mostly prepared by physical vapor deposition, which uses some physical processes, such as thermal evaporation of materials or sputtering of atoms on the surface of materials under ion bombardment, to realize the controllable transfer process of atoms from the source material to the film. Physical vapor deposition technology has many advantages, such as good film/base bonding force, uniform and compact film, controllable film thickness, wide target, wide sputtering range, thick film can be deposited, alloy film with stable composition and good repeatability. At the same time, physical vapor deposition can be used as the final processing process for HSS and cemented carbide film tools because the processing temperature can be controlled below 500℃. Because physical vapor deposition technology can greatly improve the cutting performance of cutting tools, people are competing to develop high performance and high reliability equipment, but also the expansion of its application fields, especially in the application of high-speed steel, carbide and ceramic tools for more in-depth research.
Chemical vapor deposition technology is the elemental gas containing a membrane element or compound supply base, with the aid of the gas phase or substrate on the surface of a chemical reaction, on the matrix method of making metal or compound film, mainly including atmospheric pressure chemical vapor deposition, low pressure chemical vapor deposition and has both features of CVD and PVD plasma chemical vapor deposition, etc.
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance
Product Tags:
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Vacuum Coating Gr1 Titanium Tube Targets ASTM B861-06A OD133mm Images
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